E.i. Dupont De Nemours and Company

Robert B Heiart

Abraham B Cohen

James William O'Neil

Magalie M Charles

A process is disclosed for the application of a photosensitive liquid between the substrate and the photomask during contact printing. The substrate and photomask are aligned in a hinged relationship.

Registering and exposing sheet substrates using photosensitive liquid

Apparatus for registering and imagewise exposing to actinic radiation a sequence of similar sheet substrates employing liquid applicator means to allow a photomask to contact a photosensitive layer on the substrate through a liquid.

Automatic repetitive registration and imagewise exposure of sheet

Method for repetitive registering and imagewise exposing to actinic radiation a sheet substrate containing a photosensitive layer with use of a sequence of related photomasks. A liquid layer separates the photosensitive layer and each photomask during the exposure step.

Sequential automatic registration and imagewise exposure of a sheet

Method and apparatus for registering and imagewise exposing to actinic radiation a sequence of similar sheet substrates. A liquid layer separates the photosensitive layer and each photomask during the exposure step.

Automatic repetitive registration and image wise exposure of sheet

Method for registering and imagewise exposing to actinic radiation a sequence of sheet substrates which are registerable to one another to produce a composite image. A liquid layer separates the photomask and photosensitive layer of the substrate during the exposure.

Multiple registration and imaging process to form a set of registered

An imaged element containing a polymeric relief or stencil image, in which the polymer contains crosslinkable moieties, is subjected to an image enlargement process by contacting the image with a solution containing a swelling agent for the image, and a crosslinking agent. The process is particularly useful in enlarging the half-tone image dot area of photopolymer litho masks wherein the half-tone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.

Dot-enlargement process for photopolymer litho masks

Process for modifying tacky surfaces, e.g., tacky layer on a photograph or other photochemically produced record, which comprises applying an admixture of particulate material and carrier particles and removing the excess particulate material and carrier particles. The ratio of average particle diameter of the carrier particles to average particle diameter of the particulate material is greater than 2 and the weight ratio of particulate material to carrier particles is less than 1. The degree of surface modification, e.g., light reflectivity, etc., can be controlled by the process.

Process for modifying tacky surfaces

A process for forming a photoresist which comprises:

Method for making photoresists

Process for forming images by heating, imagewise, to a temperature above a softening temperature, but below the thermal decomposition temperature, a solid layer of a mixture of a thermoplastic, amorphous, organic polymer and a liquid plasticizer therefor, the mixture being capable of existing in a metastable state and a stable state for a period sufficient to convert the stable polymer to the metastable state, heating the entire surface of the layer to a temperature between the softening temperature of the stable and metastable states, and converting the softened exposed image areas to a visible image by applying finely divided colored particles to the layer and removing them from nonexposed areas or by thermal transfer. The simple procedure is a dry process, and images of high quality and stability are obtained rapidly.

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Middletown, NJ, United States of America

Robert B Heiart