Glen Allen, VA, United States of America

Robert A Jurjevic


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1998-1999

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2 patents (USPTO):Explore Patents

Title: Innovations of Robert A Jurjevic

Introduction

Robert A Jurjevic is an accomplished inventor based in Glen Allen, VA (US). He has made significant contributions to the field of Chemical Mechanical Polishing (CMP) technology. With a total of 2 patents to his name, Jurjevic's work focuses on enhancing the efficiency and effectiveness of brush cleaning devices used in semiconductor manufacturing.

Latest Patents

One of Jurjevic's latest patents is a contamination measuring device designed for CMP brush cleaners. This invention includes a collection device that is mounted in a brush cleaning device to collect effluent flowing off a wafer. The effluent is then passed to a particle counter that measures contamination levels. A computer stores the data collected by the particle counter, computes the particles per liter of effluent, and provides real-time data. This innovation allows for predicting when the brushes in the cleaning device should be replaced based on the contamination of the effluent.

Career Highlights

Jurjevic is currently employed at International Business Machines Corporation (IBM), where he continues to develop innovative solutions in the field of semiconductor manufacturing. His work has contributed to advancements in the efficiency of cleaning processes, which are critical for maintaining the quality of semiconductor devices.

Collaborations

Throughout his career, Jurjevic has collaborated with notable colleagues, including Donald M DeCain and Cuc Kim Huynh. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Robert A Jurjevic's contributions to CMP technology through his patents and work at IBM highlight his role as a significant innovator in the field. His inventions not only improve cleaning processes but also enhance the overall quality of semiconductor manufacturing.

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