This inventor holds 1 USPTO granted patent. Top assignee: Yeda Research and Develpment & Co. Ltd. Active years: 2008.
Company Filing History:
Years Active: 2008
Title: Rivka Maoz: Innovator in Constructive Nanolithography
Introduction
Rivka Maoz is a prominent inventor based in Rehovot, Israel. She has made significant contributions to the field of nanotechnology, particularly through her innovative work in constructive nanolithography. Her research focuses on the development of advanced materials and techniques that have the potential to revolutionize various applications in science and technology.
Latest Patents
Rivka Maoz holds a patent for her invention titled "Constructive Nanolithography." This patent describes a patterned organic monolayer or multilayer film that is self-assembled on a solid substrate. The unique aspect of her invention lies in the site-defined surface chemical modification that is non-destructively inscribed in the organic layers. This is achieved using an electrically biased conducting scanning probe device, stamping device, or liquid metal, among other tools, to create a chemical modification pattern upon the application of an electrical bias. She has 1 patent to her name.
Career Highlights
Rivka has been associated with Yeda Research and Development Company Ltd., where she has been able to apply her expertise in nanotechnology. Her work has garnered attention for its innovative approach and potential applications in various fields, including electronics and materials science.
Collaborations
Throughout her career, Rivka has collaborated with notable colleagues such as Jacob Sagiv and Sidney R. Cohen. These collaborations have further enriched her research and contributed to the advancement of her projects.
Conclusion
Rivka Maoz is a trailblazer in the field of constructive nanolithography, with her innovative patent showcasing her expertise and dedication to advancing technology. Her contributions continue to inspire future developments in nanotechnology.