Kawasaki, Japan

Ritsuko Azuma


 

Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 16(Granted Patents)


Location History:

  • Kawasaki, JP (2010 - 2013)
  • Minato-ku, JP (2014)

Company Filing History:


Years Active: 2010-2014

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5 patents (USPTO):Explore Patents

Title: Ritsuko Azuma: Innovator in Polyurethane Technology

Introduction

Ritsuko Azuma is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of polyurethane technology, holding a total of 5 patents. Her work focuses on developing materials with enhanced electrical insulating properties and flexibility.

Latest Patents

One of her latest patents involves the creation of carboxyl group-containing polyurethanes derived from (poly)carbonate polyols. This invention aims to provide polyurethanes that exhibit minimal curing warpage while delivering excellent electrical insulating properties. The carboxyl group-containing polyurethane is synthesized from a combination of materials, including a (poly)carbonate polyol, a polyisocyanate, and a carboxyl group-containing polyol. Another notable patent is a curable composition that ensures low warpage and long-term electrical insulation reliability, comprising various components such as polyurethane with functional groups, γ-butyrolactone, and inorganic fine particles.

Career Highlights

Ritsuko Azuma is currently employed at Showa Denko K.K., where she continues to innovate in the field of materials science. Her work has been instrumental in advancing the applications of polyurethanes in various industries.

Collaborations

Throughout her career, Ritsuko has collaborated with notable colleagues, including Hiroshi Uchida and Kazuhiko Ooga. These partnerships have contributed to the successful development of her patented technologies.

Conclusion

Ritsuko Azuma's contributions to polyurethane technology highlight her role as a leading inventor in her field. Her innovative patents reflect her commitment to enhancing material properties for practical applications.

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