San Jose, CA, United States of America

Rithy Hang


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: Rithy Hang: Innovator in Design Rule Technologies

Introduction

Rithy Hang is a notable inventor based in San Jose, California, recognized for his innovative contributions to design tool technologies. With a focus on enhancing the efficiency of design rule evaluation, he holds a patent that reflects his expertise in the field.

Latest Patents

Rithy Hang's most significant patent is the "Variable Design Rule Tool." This invention employs memory units to determine the specific points where a design rule fails, thus enabling engineers and designers to identify problems more effectively. The tool generates a bitmap that indicates failure points for various rules, which can also aid in detecting misalignment errors. The memory cells, primarily SRAM units, are arranged in a 4×4 matrix format, organized into four 16×16 matrices, enhancing the precision and efficiency of the design process.

Career Highlights

Currently, Rithy Hang is associated with Advanced Micro Devices Corporation, a leading company in the semiconductor industry. His role involves collaborating closely with teams to innovate and improve design methodologies. His patent showcases his commitment to contributing to cutting-edge technologies in the field.

Collaborations

Throughout his career, Rithy has worked alongside esteemed colleagues such as Wiley Eugene Hill and Kurt Taylor. Their collaborations have fostered a creative environment where innovative ideas and technologies can flourish, further benefiting their projects and the company as a whole.

Conclusion

Rithy Hang's contributions to the field of design tools, particularly with his patented Variable Design Rule Tool, exemplify the impact of innovation in technology. As he continues to work at Advanced Micro Devices Corporation alongside his talented colleagues, his efforts will likely lead to further advancements that shape the future of design engineering.

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