Company Filing History:
Years Active: 2004-2006
Title: Rita Slilaty: Innovator in Semiconductor Technology
Introduction
Rita Slilaty is a prominent inventor based in Portland, Oregon. She has made significant contributions to the field of semiconductor technology, particularly in the area of shallow trench isolation structures. With a total of two patents to her name, Rita has demonstrated her expertise and innovative spirit in her work.
Latest Patents
Rita's latest patents focus on improving the topography of shallow trench isolation (STI) structures. The first patent describes a method where ions are implanted into the dielectric layer and/or barrier layer over a semiconductor substrate. This process alters the polish rates of either or both layers during the formation of the STI structure. The ion implantation technique enhances polish selectivity and minimizes unwanted topography resulting from chemical mechanical polishing (CMP). The outcome is a more uniform and smooth topography for the STI structure. The second patent reiterates this innovative approach, emphasizing the importance of ion implantation in achieving optimal results in semiconductor manufacturing.
Career Highlights
Rita Slilaty is currently employed at Intel Corporation, a leading company in the technology sector. Her work at Intel has allowed her to collaborate with some of the brightest minds in the industry, further advancing her research and development efforts.
Collaborations
One of her notable coworkers is Leonard C. Pipes, with whom she has likely shared insights and expertise in their field.
Conclusion
Rita Slilaty's contributions to semiconductor technology through her innovative patents and work at Intel Corporation highlight her as a key figure in the industry. Her dedication to improving shallow trench isolation structures showcases her commitment to advancing technology.