Praroman, Switzerland

Rita Pitteloud


Average Co-Inventor Count = 1.5

ph-index = 6

Forward Citations = 177(Granted Patents)


Location History:

  • Fribourg, CH (1989)
  • Praroman, CH (1992 - 1999)

Company Filing History:


Years Active: 1989-1999

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26 patents (USPTO):Explore Patents

Title: Rita Pitteloud: Innovator in Stabilizer Compounds

Introduction: Rita Pitteloud, based in Praroman, Switzerland, is a notable inventor and researcher recognized for her significant contributions in the field of chemical stabilization. With a remarkable portfolio of 26 patents, her work primarily focuses on innovative stabilizers designed to protect organic materials from degradation caused by oxidative, thermal, or light exposure.

Latest Patents: Among her latest inventions are two noteworthy patents. The first involves HALS phosphites and HALS phosphoramides, which serve as stabilizers for organic materials against oxidative, thermal, or light-induced degradation. The compounds she developed possess unique structural features that enhance their effectiveness as stabilizers. The second patent describes cyclic diphenylacetonitriles as stabilizers, showcasing compounds with innovative structures that prevent thermal, oxidative, or light-induced degradation of organic materials.

Career Highlights: Rita has built a commendable career, including her tenure at renowned companies such as Ciba-Geigy Corporation and Ciba Specialty Chemicals Corporation. Her work with these leading firms has allowed her to develop and patent groundbreaking technologies that contribute significantly to the field of chemical stabilization.

Collaborations: Throughout her career, Rita has collaborated with esteemed colleagues, including Paul Dubs and Bernard Gilg. These partnerships have enriched her research and have been pivotal in bringing innovative ideas to fruition.

Conclusion: Rita Pitteloud's dedication to innovation and her extensive patent portfolio underscore her influence in developing stabilizers for organic materials. Her contributions continue to advance the field and inspire future innovations in materials science.

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