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For the Inventor, By the Inventor

Ithaca, NY, United States of America

Rishi Raj

USPTO Granted Patents = 14

Average Co-Inventor Count = 2.0

ph-index = 8

Forward Citations = 449(Granted Patents)


Company Filing History:

goldMedal13 out of 2,885 
 
Cornell University
 patents
silverMedal3 out of 3 
 
Jupiter Technologies, Inc.
 patents
where one patent can have more than one assignee

Years Active: 1984-1995

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14 patents (USPTO):Explore Patents
1. 5451260 - Method and apparatus for CVD using liquid delivery system with an (1995-09-19),
2. 5206083 - Diamond and diamond-like films and coatings prepared by deposition on (1993-04-27),
3. 5183602 - Infra red diamond composites (1993-02-02),
4. 5173354 - Non-beading, thin-film, metal-coated ceramic substrate (1992-12-22),
5. 5102720 - Co-fired multilayer ceramic tapes that exhibit constrained sintering (1992-04-07),
6. 5074941 - Enhancing bonding at metal-ceramic interfaces (1991-12-24),
7. 4939120 - Superconducting rotating assembly (1990-07-03),
8. 4886778 - Superconducting rotating assembly (1989-12-12),
9. 4871496 - Composites comprising silicon carbide fibers dispersed in (1989-10-03),
10. 4849142 - Superplastic forging of zirconia ceramics (1989-07-18),
11. 4806198 - Producing alpha-alumina whiskers (1989-02-21),
12. 4732719 - Superplastic forging nitride ceramics (1988-03-22),
13. 4552711 - Use of free silicon in liquid phase sintering of silicon nitrides and (1985-11-12),
14. 4487840 - Use of silicon in liquid sintered silicon nitrides and sialons (1984-12-11),

Title: Rishi Raj: Innovator in Chemical Vapor Deposition Technologies

Introduction

Rishi Raj is a prominent inventor based in Ithaca, NY (US). He has made significant contributions to the field of chemical vapor deposition (CVD) technologies. With a total of 14 patents to his name, Rishi Raj has established himself as a key figure in innovation.

Latest Patents

One of his latest patents is a method and apparatus for CVD using a liquid delivery system. This innovative system employs one or more ultrasonic atomizing nozzles to inject liquid precursor solutions directly into a CVD reactor chamber. The liquid delivery system can operate in either continuous or pulsed mode. In pulsed mode, measured pulses of the liquid precursor solution are injected, allowing for precise control of film deposition rates, achieving as fine as monolayers per pulse. The use of ultrasonic nozzles ensures that the liquid is vaporized in the reactor chamber, resulting in uniform deposition of films on substrates. Another notable patent involves novel diamond thin films deposited on a metal or ceramic composite. These films improve the erosion resistance of materials used for long-wave infrared transmitting applications, such as domes and infrared windows.

Career Highlights

Rishi Raj has worked with notable organizations, including the Cornell Research Foundation Inc. and Jupiter Technologies, Inc. His work has significantly advanced the understanding and application of CVD technologies.

Collaborations

Throughout his career, Rishi Raj has collaborated with esteemed colleagues, including Prakash Chandra Panda and Edgar R Seydel. Their combined expertise has contributed to the success of various projects and innovations.

Conclusion

Rishi Raj's contributions to the field of chemical vapor deposition are noteworthy. His innovative patents and collaborations have paved the way for advancements in material science and engineering. His work continues to influence the industry and inspire future innovations.

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