Tokyo, Japan

Rintaro Kajiwara

This inventor holds 1 USPTO granted patent, plus 1 CIPO patent and 1 EPO patent. Top assignee: Ihi Corporation. Active years: 2016.


% Patents Active = 100.0


 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 17(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Rintaro Kajiwara: Innovator in Fan Rotor Blade Technology

Introduction

Rintaro Kajiwara is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of fan technology, particularly with his innovative designs that enhance performance and efficiency. His work is recognized for its practical applications in various industries.

Latest Patents

Kajiwara holds a patent for a fan rotor blade that features a unique construction. The fan rotor blade includes a blade body and a blade root, both made from a composite material. Additionally, it has a sheath attached to the leading edge of the blade body. This sheath is segmented into a base segment and a top segment, with the top segment being longer than the base segment. The design ensures that the fan rotor blade possesses sufficient impact resistance while being simplified and lightweight. He has 1 patent to his name.

Career Highlights

Kajiwara is currently employed at IHI Corporation, where he continues to innovate and develop new technologies. His work at the company has positioned him as a key player in advancing fan technology. His contributions have been instrumental in improving the efficiency and durability of fan systems.

Collaborations

Kajiwara collaborates with talented colleagues, including Takeshi Murooka and Hiroshi Kuroki. Together, they work on various projects that push the boundaries of fan technology and enhance product performance.

Conclusion

Rintaro Kajiwara is a distinguished inventor whose work in fan rotor blade technology exemplifies innovation and practicality. His contributions continue to impact the industry positively, showcasing the importance of research and development in engineering.

Profile summary based on public USPTO records.
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