Osaka, Japan

Rina Okada

This inventor holds 11 USPTO granted patents and 4 published patent applications and 1 EPO patent. Top assignee: Kyocera Document Solutions Inc.. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rina Okada. Retrieved from https://idiyas.com/inventor/rina-okada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11 

% Patents Active = 72.7

 

Average Co-Inventor Count = 1.9

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2019-2026

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11 patents (USPTO):Explore Patents

Title: Rina Okada: Innovator in Sheet Postprocessing Technology

Introduction

Rina Okada is a prominent inventor based in Osaka, Japan. She has made significant contributions to the field of sheet postprocessing technology, holding a total of 11 patents. Her innovative designs and systems have advanced the efficiency and functionality of document processing.

Latest Patents

Among her latest patents is a "Sheet postprocessing apparatus including restriction device that restricts movement of lower guide of inlet guide." This apparatus features an inlet guide, a perforation device, and a collection tank. The design allows for the lower guide to pivot in an up-down direction, enhancing the overall functionality of the system. Another notable patent is the "Perforation device and sheet post-processing device provided therewith." This device includes a shaft, a perforation motor, and multiple perforation portions, allowing for precise control during the perforation process.

Career Highlights

Rina Okada is currently employed at Kyocera Document Solutions Inc., where she continues to innovate and develop new technologies. Her work has been instrumental in improving document processing systems, making them more efficient and user-friendly.

Collaborations

Throughout her career, Rina has collaborated with notable colleagues such as Yasunori Ueno and Terumitsu Noso. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in the field.

Conclusion

Rina Okada's contributions to sheet postprocessing technology exemplify her dedication to innovation and excellence. Her patents and collaborative efforts continue to shape the future of document processing systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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