This inventor holds 2 USPTO granted patents. Top assignee: Creative Technology Corporation. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo, JP (2012)
- Kawasaki, JP (2012)
Company Filing History:
Years Active: 2012
Title: Riichiro Harano: Innovator in Substrate Technology
Introduction
Riichiro Harano is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate technology, particularly in the removal of foreign materials from substrates. His innovative approaches have led to the development of advanced apparatuses and methods that enhance efficiency and reliability in various applications.
Latest Patents
Harano holds 2 patents, with his latest inventions focusing on improving substrate processing. One of his notable patents is an "Apparatus for removing foreign material from substrate and method for removing foreign material from substrate." This invention provides a reliable solution for removing foreign materials while minimizing the risk of redeposition. The apparatus includes electrostatic chucks that attract the substrate, along with a resin sheet supplying mechanism that aids in the removal process.
Another significant patent is the "Electrostatic chuck and electrode sheet for electrostatic chuck." This invention features a laminate structure designed to enhance chucking and holding forces. The electrostatic chuck is engineered with a pattern electrode that optimizes performance, ensuring effective substrate handling.
Career Highlights
Harano is associated with Creative Technology Corporation, where he continues to push the boundaries of innovation in substrate technology. His work has been instrumental in developing solutions that cater to the needs of various industries, particularly those requiring precision in substrate processing.
Collaborations
Throughout his career, Harano has collaborated with notable colleagues, including Hiroshi Fujisawa and Kinya Miyashita. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Riichiro Harano's contributions to substrate technology exemplify the spirit of innovation. His patents reflect a commitment to enhancing processes and improving outcomes in the industry. His work continues to inspire future advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile