Hino, Japan

Rieko Seike

This inventor holds 1 USPTO granted patent. Top assignee: Konica Minolta, Inc.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rieko Seike. Retrieved from https://idiyas.com/inventor/rieko-seike

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Rieko Seike: Innovator in Inkjet Technology

Introduction

Rieko Seike is a notable inventor based in Hino, Japan. She has made significant contributions to the field of inkjet technology, particularly through her innovative designs and methods.

Latest Patents

Rieko Seike holds a patent for an inkjet recording device, which includes a method for adjusting and controlling the device. The invention features an inkjet discharge head with a nozzle for ink discharge, a pressure chamber, and a pressure generator that creates pressure changes in the ink. This design allows for precise control of ink discharge, enhancing the efficiency and quality of inkjet printing.

Career Highlights

Seike is currently employed at Konica Minolta, Inc., where she continues to develop cutting-edge technologies in the printing industry. Her work has been instrumental in advancing inkjet technology, making it more reliable and effective for various applications.

Collaborations

Rieko Seike collaborates with her coworker, Takakazu Kuki, who also contributes to the innovative projects at Konica Minolta, Inc. Their teamwork exemplifies the synergy that drives technological advancements in their field.

Conclusion

Rieko Seike's contributions to inkjet technology highlight her role as a leading inventor in the industry. Her innovative patent and ongoing work at Konica Minolta, Inc. demonstrate her commitment to enhancing printing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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