This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2001.
Company Filing History:
Years Active: 2001
Title: Rick J Heh - Innovator in Photolithography Technology
Introduction
Rick J Heh is a notable inventor based in Underhill, Vermont, who has made significant contributions to the field of photolithography. He is recognized for his innovative approach to creating a static resistant reticle, which enhances the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Rick J Heh holds a patent for a "Static Resistant Reticle." This invention is designed for use in photolithography and features optimal transmission while reducing electrostatic discharge. The reticle consists of a substrate, a patterning layer, and two layers of materials with differing refractive indices. The first layer has a higher refractive index than the second, and at least one of these layers is conductive. This design allows for an anti-reflective coating that optimizes light transmission through the reticle substrate to approximately 98.0% to 99.5% at wavelengths between 360 nm and 370 nm. The conductivity of the layers further minimizes electrostatic discharge, improving the delineation of patterns projected onto silicon wafers used in semiconductor devices. The preferred materials for the layers include ruthenium oxide and silica, with a method for fabricating the reticle and patterning silicon wafers also described in the patent.
Career Highlights
Rick J Heh is associated with the International Business Machines Corporation (IBM), where he has applied his expertise in photolithography to advance semiconductor technology. His work has been instrumental in improving the manufacturing processes that are critical to the electronics industry.
Collaborations
Throughout his career, Rick has collaborated with notable colleagues, including Andrew Bessy and James Patrick Doyle. These collaborations have contributed to the development of innovative technologies in the field.
Conclusion
Rick J Heh's contributions to photolithography through his static resistant reticle patent exemplify his commitment to innovation in semiconductor technology. His work continues to influence the industry and enhance manufacturing processes.