Shanghai, China

Rick Ha

This inventor holds 2 USPTO granted patents. Top assignee: Keyway Innovations (Shanghai) Company Limited. Active years: 2016-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Rick Ha. Retrieved from https://idiyas.com/inventor/rick-ha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 37(Granted Patents)


Company Filing History:


Years Active: 2016-2020

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2 patents (USPTO):Explore Patents

Title: Rick Ha: Innovator in Beverage Technology from Shanghai

Introduction

Rick Ha is an innovative inventor based in Shanghai, China. With a strong focus on creating advancements in beverage technology, he has successfully secured two patents that showcase his creativity and technical prowess.

Latest Patents

Among his latest innovations is a cutting-edge beverage maker. This invention demonstrates his ability to combine functionality and user experience, making it easier for consumers to enjoy their favorite beverages.

Career Highlights

Rick Ha is currently a prominent member of Keyway Innovations (Shanghai) Company Limited. His work with the company highlights his commitment to driving progress in the field of beverage equipment, contributing to both the company and the industry at large.

Collaborations

He collaborates with talented coworkers, including Karen Wai Wan and Nicolas Philippe Roux, fostering a creative environment that promotes collective growth and innovation. Together, they combine their unique skills and perspectives to push the boundaries of beverage technology.

Conclusion

With a passion for invention and a dedication to improving consumer experiences, Rick Ha continues to make a significant impact in the beverage industry. As he further develops his ideas and explores new opportunities, the future looks promising for both him and the innovations he represents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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