Clifton, IL, United States of America

Richard W Dennis, Ii

This inventor holds 1 USPTO granted patent. Top assignee: United States Filter Corporation. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard W Dennis, Ii. Retrieved from https://idiyas.com/inventor/richard-w-dennis-ii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 35(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Richard W. Dennis, II: Innovator in Time-Based Proportional Control

Introduction

Richard W. Dennis, II is an accomplished inventor based in Clifton, Illinois. He has made significant contributions to the field of control systems, particularly with his innovative approach to time-based proportional control. His work is particularly relevant in applications where variable conditions can impact performance.

Latest Patents

Richard W. Dennis, II holds a patent for an invention titled "Enhanced Time-Based Proportional Control." This invention introduces a device and method that incorporates a deviation compensation function. This function is designed to automatically adjust the offset used in time-based proportional control. The improvement is especially useful in environments such as public pools, where daily bather loads can fluctuate due to weather and other unpredictable factors. He has 1 patent to his name.

Career Highlights

Richard W. Dennis, II is associated with United States Filter Corporation, where he applies his expertise in control systems. His role at the company allows him to further develop and implement innovative solutions that enhance operational efficiency.

Collaborations

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Conclusion

Richard W. Dennis, II is a notable inventor whose work in time-based proportional control has the potential to improve various applications, particularly in public facilities. His contributions reflect a commitment to innovation and practical solutions in engineering.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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