Richard W Brodowski

Title: The Innovative Contributions of Richard W. Brodowski

Introduction

Richard W. Brodowski is a notable inventor based in Fremont, California. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work has implications for the efficiency and effectiveness of wafer processing in the semiconductor industry.

Latest Patents

Brodowski holds a patent for a method titled "Introducing and reclaiming liquid in a wafer processing chamber." This invention describes a processing chamber designed for depositing and/or removing material onto/from a semiconductor wafer. The process involves the use of an electrolyte and an electric field, where the electrolyte is introduced and evacuated from a closely confined containment region. A hollow sleeve forms a containment chamber for holding the electrolyte, and the wafer is moved vertically to engage the sleeve, creating an enclosing floor for the chamber. The design includes electrodes that are protected from the electrolyte during processing, enhancing the overall functionality of the system.

Career Highlights

Brodowski is currently employed at Cutek Research, Inc., where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing the capabilities of wafer processing, contributing to the efficiency of semiconductor manufacturing.

Collaborations

Throughout his career, Brodowski has collaborated with notable colleagues, including Chiu H. Ting and William H. Holtkamp. These collaborations have fostered an environment of innovation and have led to advancements in their respective fields.

Conclusion

Richard W. Brodowski's contributions to semiconductor processing through his patent demonstrate his commitment to innovation in technology. His work at Cutek Research, Inc. and collaborations with esteemed colleagues further highlight his impact on the industry.