This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2004
Title: Richard Vay Oney: Innovator in Less-Lethal Technology
Introduction
Richard Vay Oney is an accomplished inventor based in Baroda, MI (US). He has made significant contributions to the field of less-lethal weaponry, focusing on innovative solutions that prioritize safety and effectiveness. His work is particularly relevant in situations where lethal force is not appropriate.
Latest Patents
Richard Vay Oney holds a patent for a less-lethal launcher. This projectile launching system features an independently operable gas-powered mechanism capable of firing projectiles containing incapacitating, debilitating, or marking agents. The design is intended for use in scenarios where lethal force would be inappropriate. The gas-powered launcher is ergonomically designed, featuring a detachable receiver housing that can be integrated with a rifle, providing both lethal and less-lethal capabilities. One of the standout ergonomic features is the receiver's ability to carry a compressed gas container efficiently, ensuring a favorable profile and convenient trigger location.
Career Highlights
Throughout his career, Richard has demonstrated a commitment to developing innovative solutions that enhance safety in various situations. His patent reflects his dedication to creating technology that can be used responsibly and effectively.
Collaborations
Richard has worked alongside notable colleagues, including Steve Doehler and Gary A Sniezak. Their collaboration has likely contributed to the development and refinement of his innovative projects.
Conclusion
Richard Vay Oney's contributions to the field of less-lethal technology highlight the importance of innovation in creating safer alternatives for law enforcement and other applications. His work exemplifies the potential for technology to address critical needs in society.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile