San Jose, CA, United States of America

Richard V Rafloski

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard V Rafloski. Retrieved from https://idiyas.com/inventor/richard-v-rafloski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 16(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovations of Richard V Rafloski

Introduction

Richard V Rafloski is an accomplished inventor based in San Jose, California. He is known for his significant contributions to the field of chemical mechanical polishing systems. With a focus on enhancing the efficiency and effectiveness of these systems, Rafloski has made a notable impact in the industry.

Latest Patents

Rafloski holds a patent for a "Linear conditioner apparatus for a chemical mechanical polishing system." This innovative apparatus utilizes one or more linear conditioners that extend from the edge of the polishing pad almost to the center. The design includes two conditioner rods positioned on either side of a radial segment, allowing for independent pivoting about a lateral axis. This unique mechanism ensures that if one rod rises, the other is forced downward, optimizing the conditioning process. The linear conditioners can be actuated by a piezoelectric member or swept by an arm toward and away from the center of the polishing pad. This patent exemplifies Rafloski's commitment to advancing technology in his field.

Career Highlights

Rafloski's career is marked by his role at Applied Materials, Inc., a leading company in the semiconductor and display manufacturing industries. His work has contributed to the development of advanced manufacturing processes that are crucial for producing high-quality electronic components.

Collaborations

Throughout his career, Rafloski has collaborated with notable colleagues, including Stephen J Blumenkranz and Manoocher Birang. These partnerships have fostered innovation and have led to advancements in the technologies they work on.

Conclusion

Richard V Rafloski's contributions to the field of chemical mechanical polishing systems highlight his innovative spirit and dedication to technological advancement. His patent and work at Applied Materials, Inc. reflect his significant role in shaping the future of manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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