Richard S Hutton

Title: Richard S. Hutton: Innovator in Lithographic Processes

Introduction

Richard S. Hutton is a notable inventor based in Summit, NJ (US). He has made significant contributions to the field of lithographic processes, particularly in the manufacturing of integrated circuit devices. His innovative approach has led to the development of a unique surface-imaging technique that enhances the precision of device fabrication.

Latest Patents

Richard S. Hutton holds 1 patent for his invention titled "Surface-imaging technique for lithographic processes for device." This patent discloses a method that produces an image on a resist applied to a substrate. The process involves exposing selected regions of the resist material to radiation, which corresponds to the desired image. Following this, the resist is treated with a silylating reagent that selectively reacts with either the exposed or unexposed regions. The combination of the silylating reagent with a cross-linking reagent allows for the formation of a reactive ion etching mask, providing precise image transfer from the resist to the substrate.

Career Highlights

Richard is currently associated with AT&T Corp., where he continues to innovate in the field of lithography. His work has been instrumental in advancing techniques that improve the efficiency and accuracy of integrated circuit manufacturing.

Collaborations

Throughout his career, Richard has collaborated with notable colleagues, including Gary N. Taylor and David R. Wheeler. These partnerships have fostered an environment of innovation and have contributed to the success of various projects.

Conclusion

Richard S. Hutton's contributions to lithographic processes exemplify the spirit of innovation in technology. His patented techniques are paving the way for advancements in integrated circuit manufacturing, showcasing the importance of inventors in shaping the future of technology.