Company Filing History:
Years Active: 2012
Title: Richard Romine - Innovator in Silicon Polishing Compositions
Introduction
Richard Romine is a notable inventor based in Geneva, IL (US). He has made significant contributions to the field of chemical-mechanical polishing through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of silicon polishing compositions.
Latest Patents
Richard Romine holds a patent for "Silicon polishing compositions with high rate and low defectivity." This invention relates to a chemical-mechanical polishing composition that includes silica, one or more organic carboxylic acids or salts, one or more polysaccharides, bases, and optionally surfactants, polymers, reducing agents, biocides, and water. The polishing composition is characterized by an alkaline pH, exhibiting a high removal rate while minimizing particle defects and haze. Additionally, the invention outlines a method for chemically-mechanically polishing a substrate using this composition.
Career Highlights
Richard Romine is associated with Cabot Microelectronics Corporation, where he has contributed to advancements in polishing technologies. His work has been instrumental in improving the quality and efficiency of semiconductor manufacturing processes.
Collaborations
Throughout his career, Richard has collaborated with notable colleagues, including Michael L. White and Brian Reiss. These collaborations have fostered innovation and development in the field of chemical-mechanical polishing.
Conclusion
Richard Romine's contributions to silicon polishing compositions demonstrate his commitment to innovation in the semiconductor industry. His patent reflects a significant advancement in polishing technology, showcasing his expertise and dedication to improving manufacturing processes.