Company Filing History:
Years Active: 1996
Title: The Innovative Contributions of Richard P. VanMeurs
Introduction
Richard P. VanMeurs is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique etching apparatus that enhances the trench etching process in semiconductor materials.
Latest Patents
Richard P. VanMeurs holds a patent for a "Method and apparatus of etching a clean trench in a semiconductor." This etching apparatus includes a process chamber partially surrounded by an upper electrode and a lower electrode. A semiconductor material lies within the process chamber and is in contact with the lower electrode. The lower electrode is connected to a first power supply operating at a substantially high frequency and a second power supply operating at a relatively low frequency. The lower frequency provides a degree of anisotropic control to the trench etching process. This added control allows for the elimination of sidewall deposition enhancing materials within the plasma chemistry introduced into the process chamber. As a result, the buildup of residue due to sidewall deposition does not occur within the process chamber.
Career Highlights
Richard P. VanMeurs is associated with Texas Instruments Corporation, where he has contributed to advancements in semiconductor technology. His work has been instrumental in improving the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Richard has collaborated with notable coworkers such as Gabriel George Barna and James G. Frank. Their combined expertise has furthered the development of innovative solutions in the semiconductor industry.
Conclusion
Richard P. VanMeurs is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His patent for an etching apparatus demonstrates his commitment to innovation and excellence in the field.