This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1997-1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1997-1998
Title: Richard Michael Shroedl: Innovator in Metal Mask Technology
Introduction
Richard Michael Shroedl is a notable inventor based in Staatsburg, NY (US). He has made significant contributions to the field of printing technology, particularly through his innovative designs for metal masks used in coating applications. With a total of 2 patents, Shroedl's work has enhanced the efficiency and effectiveness of material deposition processes.
Latest Patents
Shroedl's latest patents include the "Flex tab thick film metal mask to deposit coating material" and the "Flex tab thick film metal mask." Both patents describe a mask for printing patterns on substrates, which consists of a metal sheet featuring openings interconnected by tabs or bridges. These tabs are designed to provide a bending moment when force is applied, allowing for improved material deposition through the mask openings. The innovative step shape of the tabs, along with through openings, enhances patterning definition and extends the operating life of the masks compared to conventional designs.
Career Highlights
Richard Michael Shroedl is associated with International Business Machines Corporation (IBM), where he has applied his expertise in developing advanced printing technologies. His work has contributed to the company's reputation for innovation in the tech industry.
Collaborations
Shroedl has collaborated with notable coworkers such as Harry David Cox and John A Trumpetto, further enriching the collaborative environment at IBM.
Conclusion
Richard Michael Shroedl's contributions to metal mask technology exemplify the spirit of innovation in the field of printing applications. His patents reflect a commitment to enhancing operational efficiency and effectiveness in material deposition processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
