Richard M Poorman

Title: Richard M Poorman: Innovator in Vapor Deposition Technology

Introduction

Richard M Poorman is a notable inventor based in Huntsville, AL (US). He has made significant contributions to the field of vapor deposition technology, holding a total of 4 patents. His innovative approaches have advanced the methods used in thin metallic film applications.

Latest Patents

Among his latest patents, Richard developed a method and apparatus for vacuum vapor deposition. This invention utilizes an ionized gas arc directed onto a source material, which is spaced from a substrate to be coated in a substantial vacuum. The design ensures a pressure differential between the source and the substrate, allowing vapors to be effectively carried to the substrate. The apparatus features a modified tungsten arc welding torch with a hollow electrode, through which an inert gas flows. The arc is struck between the electrode and the source, confined within a vacuum chamber. Additionally, he created an arc/gas electrode designed for use under vacuum conditions. This electrode includes a first housing enclosing a second housing, with provisions for circulating coolant to maintain optimal temperatures during operation.

Career Highlights

Richard has worked with the United States of America as represented by the Administrator of the National Aeronautics and Space Administration (NASA). His work has contributed to advancements in aerospace technologies and materials science.

Collaborations

Throughout his career, Richard has collaborated with notable colleagues, including Jack Lee Weeks and Deborah D Schmidt. Their combined expertise has fostered innovation in their respective fields.

Conclusion

Richard M Poorman's contributions to vapor deposition technology and his collaborations with esteemed colleagues highlight his impact on the industry. His innovative patents continue to influence advancements in material applications.