Richard M Cloutier

Title: The Innovative Contributions of Richard M. Cloutier

Introduction

Richard M. Cloutier is a notable inventor based in Salisbury, MA (US), recognized for his significant contributions to the field of ion implantation technology. With a total of five patents to his name, Cloutier has made advancements that enhance the efficiency and effectiveness of ion sources used in various applications.

Latest Patents

Cloutier's latest patents include innovative designs for ion sources. One of his patents, titled "Cathode mounting for ion source with indirectly heated cathode," describes an ion source designed for use in an ion implanter. This invention features a gas confinement chamber with conductive walls that define a gas ionization zone, allowing ions to exit through an exit opening. Another significant patent is the "Endcap for indirectly heated cathode of ion source," which details a cathode structure that protects the filament from energized plasma while efficiently emitting electrons into the gas ionization zone.

Career Highlights

Richard M. Cloutier has built a successful career at Eaton Corporation, where he has applied his expertise in ion implantation technology. His work has contributed to the development of advanced ion sources that are crucial for various industrial applications. Cloutier's innovative designs have positioned him as a key figure in the field.

Collaborations

Throughout his career, Cloutier has collaborated with esteemed colleagues such as William E. Reynolds and Thomas N. Horsky. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in ion implantation.

Conclusion

Richard M. Cloutier's contributions to ion implantation technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry positively, showcasing the importance of innovation in advancing technology.