Winona, MN, United States of America

Richard Leiske


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Richard Leiske - Innovator in Stencil Cleaning Technology

Introduction

Richard Leiske is a notable inventor based in Winona, MN (US). He has made significant contributions to the field of cleaning apparatus technology, particularly with his innovative designs that enhance efficiency and functionality.

Latest Patents

Leiske holds a patent for a stencil cleaning apparatus. This invention is an adapter designed to convert an existing under screen cleaning apparatus from one that uses a solvent to a solventless version. The adapter fits within the vacuum channel and between the blades of a known under screen cleaning apparatus. It extends above the top edges of the blades and features a top surface with at least three lands and a plurality of slots. An interior hole within the adapter connects the slots with a vacuum outlet of the vacuum channel. Optionally, suction is applied to the slots by pumping air from the vacuum outlet. This innovative design aims to improve the cleaning process while reducing the reliance on solvents.

Career Highlights

Richard Leiske is currently employed at Dek Printing Machines, Ltd., where he continues to develop and refine cleaning technologies. His work has been instrumental in advancing the capabilities of printing machinery and enhancing operational efficiency.

Collaborations

Leiske collaborates with his coworker, Ricky Bennett, to further innovate and improve the products at Dek Printing Machines, Ltd. Their teamwork exemplifies the importance of collaboration in the field of invention and technology development.

Conclusion

Richard Leiske's contributions to stencil cleaning technology demonstrate his commitment to innovation and efficiency in the printing industry. His patent for a solventless cleaning apparatus is a testament to his inventive spirit and dedication to improving existing technologies.

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