Pickett, WI, United States of America

Richard L Schultz

This inventor holds 1 USPTO granted patent. Top assignee: Kolpin Manufacturing, Inc.. Active years: 1988.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard L Schultz. Retrieved from https://idiyas.com/inventor/richard-l-schultz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 48(Granted Patents)


Company Filing History:


Years Active: 1988

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1 patent (USPTO):Explore Patents

Title: The Innovations of Richard L. Schultz

Introduction

Richard L. Schultz is an accomplished inventor based in Pickett, Wisconsin. He is known for his innovative contributions to the field of camouflage technology. With a focus on creating practical solutions, Schultz has made a significant impact in his industry.

Latest Patents

Richard L. Schultz holds a patent for a unique camouflage fabric or similar article. This invention showcases his ability to blend functionality with creativity, addressing the needs of various applications in outdoor and military settings. He has 1 patent to his name, reflecting his dedication to innovation.

Career Highlights

Schultz is currently employed at Kolpin Manufacturing, Inc., where he continues to develop and refine his ideas. His work at Kolpin has allowed him to collaborate with other talented individuals in the field, further enhancing his contributions to the industry.

Collaborations

One of his notable coworkers is Ronald N. Kolpin, who shares a commitment to innovation and quality in their projects. Together, they have worked on various initiatives that aim to improve outdoor products and technologies.

Conclusion

Richard L. Schultz exemplifies the spirit of innovation through his work and patents. His contributions to camouflage technology and his collaboration with Kolpin Manufacturing, Inc. highlight his role as a significant figure in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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