This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: L-3 Communications Cincinnati Electronics Corporation. Active years: 2014-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014-2015
Title: Richard L Rawe, Jr: Innovator in Infrared Photodetector Technology
Introduction
Richard L Rawe, Jr is a notable inventor based in Melbourne, KY (US). He has made significant contributions to the field of infrared photodetector technology, holding two patents that showcase his innovative approach to device fabrication.
Latest Patents
Rawe's latest patents include the "Frontside-illuminated barrier infrared photodetector device and methods of fabricating the same." This invention describes a frontside-illuminated barrier infrared photodetector that consists of a transparent carrier substrate and a plurality of pixels. Each pixel features an absorber layer, a barrier layer, a collector layer, and a backside electrical contact. The design ensures that the barrier layer is positioned closer to the scene than the absorber layer, enhancing the device's functionality. The integration of frontside common electrical contacts bonded to the transparent carrier substrate further exemplifies the innovative nature of this technology.
Career Highlights
Rawe is currently employed at L-3 Communications Cincinnati Electronics Corporation, where he continues to develop cutting-edge technologies in the field of electronics. His work has been instrumental in advancing infrared detection methods, contributing to various applications in the industry.
Collaborations
Throughout his career, Rawe has collaborated with talented individuals such as Robert Jones and David Forrai. These partnerships have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Richard L Rawe, Jr is a distinguished inventor whose work in infrared photodetector technology has made a significant impact in the field. His patents reflect a commitment to innovation and excellence in device fabrication.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile