Richard L Hanneman

Title: Richard L Hanneman: Innovator in Continuous Film Transistor Fabrication

Introduction

Richard L Hanneman is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of electronics, particularly in the development of fabrication processes for transistors. His innovative approach has led to the creation of a unique method that enhances the efficiency of transistor production.

Latest Patents

Richard L Hanneman holds a patent for a "Continuous film transistor fabrication process." This process utilizes a roll of polyimide substrate film on which a plurality of groups of three metal contacts is patterned. The edges of the film are turned under, including portions of the metal contacts, to facilitate the ohmic bonding of the substrate contacts to other respective contacts on a support member. Holes are formed in the film between each pattern to act as indexing means for feeding the film through a series of processing stations. As the film passes through each station, a separate step in the fabrication takes place, until the completed, tested, and sorted transistors are removed from the last station. This innovative process has the potential to streamline production and improve the quality of electronic components.

Career Highlights

Richard L Hanneman is associated with Texas Instruments Corporation, a leading company in the semiconductor industry. His work at Texas Instruments has allowed him to apply his inventive skills in a practical setting, contributing to advancements in technology and electronics.

Collaborations

Throughout his career, Richard has collaborated with talented individuals such as Arthur E Horton and Jordan W Brantley. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Richard L Hanneman's contributions to the field of electronics through his continuous film transistor fabrication process exemplify the spirit of innovation. His work not only enhances the efficiency of transistor production but also showcases the importance of collaboration in driving technological advancements.