Company Filing History:
Years Active: 1999-2000
Title: The Innovative Contributions of Richard Keosian
Introduction
Richard Keosian is a notable inventor based in Nazareth, PA (US). He has made significant contributions to the field of photoresist compositions, holding 2 patents that showcase his innovative approach to polymer chemistry. His work has implications in various applications, particularly in the semiconductor industry.
Latest Patents
Keosian's latest patents include a 193 nm positive-working photoresist composition and a water-soluble negative-working photoresist composition. The positive-working photoresist is a polymer that, when combined with a suitable photoacid generator (PAG), forms a high-resolution photoresist. This polymer features a tartaric polyanhydride backbone and undergoes efficient photoacid-catalyzed cleavage, resulting in small molecular weight fragments that dissolve readily in an aqueous base developer. The design allows for high contrast and resolution in imaging, with the fused rings providing etch resistance.
The water-soluble negative-working photoresist composition is another significant innovation. This polymer, which can be based on polyvinyl ether, also utilizes a photoacid generator to create a negative working photoresist. Upon exposure to radiation, the acetal group undergoes deprotection, leading to a water-insoluble photoproduct. This process does not require crosslinking, ensuring that there is no swelling of the resist images during development, thus maintaining resolution.
Career Highlights
Throughout his career, Richard Keosian has worked with prominent companies such as Clariant International Ltd and Clariant Finance Limited. His experience in these organizations has contributed to his expertise in the development of advanced photoresist materials.
Collaborations
Keosian has collaborated with notable individuals in the field, including Iain McCulloch and Anthony J East. These collaborations have likely enriched his work and expanded the impact of his inventions.
Conclusion
Richard Keosian's contributions to the field of photoresist compositions demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of polymer chemistry and its applications in the semiconductor industry.