Newark, CA, United States of America

Richard J Suk

This inventor holds 4 USPTO granted patents. Top assignee: The Clorox Company. Active years: 1991-2011.


% Patents Active = 100.0

Average Co-Inventor Count = 4.5

ph-index = 3

Forward Citations = 78(Granted Patents)


Location History:

  • Newark, CA (US) (1991 - 1992)
  • Pleasanton, CA (US) (2010 - 2011)

Company Filing History:


Years Active: 1991-2011

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4 patents (USPTO):Explore Patents

Title: Richard J Suk - Innovator in Cleaning Substrates

Introduction

Richard J Suk is a notable inventor based in Newark, CA, who has made significant contributions to the field of cleaning substrates. With a total of four patents to his name, Suk has focused on developing innovative solutions that enhance cleaning efficiency and effectiveness.

Latest Patents

One of Suk's latest patents is for a low-density cleaning substrate. This invention features an optimized pore volume distribution that allows the substrate to hold at least 50 percent of its cumulative volume within pores with a radius size of about 110 to 250 microns. The substrate is characterized by a dry fibrous web that absorbs less than 20 percent of its cumulative volume at a pore radius of 75 microns. This optimized design enables the substrate to controllably release a fluid composition effectively onto surfaces. The basis weight of the substrate ranges from about 80 to 20 gsm, and its density is below 0.1 g/cc. The substrate can be utilized as a pre-loaded wipe, which may be moistened by the consumer prior to use or moistened before packaging. The composition loaded onto the substrate can include both dry and liquid formulations, making it suitable for cleaning various hard or soft surfaces.

Career Highlights

Richard J Suk is currently associated with The Clorox Company, where he continues to innovate in the cleaning product sector. His work has contributed to the development of advanced cleaning solutions that meet consumer needs.

Collaborations

Suk has collaborated with notable colleagues, including William Ouellette and Nikhil P Dani, to further enhance the innovation process within his field.

Conclusion

Richard J Suk's contributions to the development of low-density cleaning substrates exemplify his commitment to innovation in cleaning technologies. His patents reflect a deep understanding of material science and consumer needs, positioning him as a key figure in the industry.

Profile summary based on public USPTO records.
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