Colts Neck, NJ, United States of America

Richard J Legg

This inventor holds 1 USPTO granted patent. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard J Legg. Retrieved from https://idiyas.com/inventor/richard-j-legg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Richard J Legg: Innovator in Photographic Technology

Introduction

Richard J Legg is a notable inventor based in Colts Neck, NJ (US). He has made significant contributions to the field of photographic technology. His innovative approach has led to the development of a unique process that enhances the manufacturing of photographic elements.

Latest Patents

Richard J Legg holds a patent for a "Process for preparation of a photographic element." This patent describes an improved method for manufacturing a spectrally sensitized photographic element. The process involves the ultrafiltration of silver halide grains combined with a supersensitizing additive. This additive consists of various ions, including sodium, potassium, lithium, and ammonium, with specific parameters for their combinations.

Career Highlights

Richard J Legg is associated with E.I. du Pont de Nemours and Company, a leading organization in the field of science and technology. His work at this company has allowed him to explore and innovate within the realm of photographic materials. His patent reflects his commitment to advancing photographic technology.

Collaborations

Throughout his career, Richard has collaborated with talented individuals such as Anna E Doyle and Mark D Franke. These collaborations have likely contributed to the success of his projects and innovations.

Conclusion

Richard J Legg's contributions to photographic technology through his innovative patent demonstrate his expertise and dedication to the field. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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