Towanda, PA, United States of America

Richard J Kempf

This inventor holds 5 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 1987-1998.


% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 3

Forward Citations = 26(Granted Patents)


Company Filing History:


Years Active: 1987-1998

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5 patents (USPTO):Explore Patents

Title: Innovations of Richard J Kempf

Introduction

Richard J Kempf is a notable inventor based in Towanda, PA (US). He has made significant contributions to the field of photoimageable films and electrostatic masters. With a total of 5 patents to his name, Kempf's work has advanced the technology used in various applications.

Latest Patents

Kempf's latest patents include a process for using photoimageable films prepared for aqueous applications. This innovative process involves applying a photoimageable composition on a substrate, which contains a partially neutralized acid-containing polymer and other essential components. The composition is designed to form a stable emulsion and has specific viscosity requirements. Additionally, he has developed a high-resolution, positive-working photosensitive electrostatic master that utilizes a single imagewise exposure. This master is particularly useful in creating proofs that replicate printed images and in the manufacture of printed circuit boards.

Career Highlights

Kempf has had a distinguished career at E.I. DuPont De Nemours and Company, where he has been instrumental in developing advanced materials and processes. His expertise in photoimageable technologies has positioned him as a leader in his field.

Collaborations

Throughout his career, Kempf has collaborated with notable colleagues, including Rolf Dessauer and Steven C Freilich. These partnerships have contributed to the success of his innovative projects and patents.

Conclusion

Richard J Kempf's contributions to the field of photoimageable films and electrostatic masters highlight his role as a significant inventor. His work continues to influence advancements in technology and materials science.

Profile summary based on public USPTO records.
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