Beilstein, Germany

Richard Huber

This inventor holds 1 USPTO granted patent. Top assignee: Amann & Söhne Gmbh & Co.. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard Huber. Retrieved from https://idiyas.com/inventor/richard-huber-zt6owd0b

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 10(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Richard Huber: Innovator in Textile Dyeing Technology

Introduction

Richard Huber is a notable inventor based in Beilstein, Germany. He has made significant contributions to the field of textile technology, particularly in the area of dyeing processes. His innovative approach has led to the development of a unique patent that enhances the dyeing of textile substrates.

Latest Patents

Richard Huber holds a patent for a "Process for dyeing a textile substrate in at least one supercritical." This invention represents a breakthrough in the textile industry, allowing for more efficient and environmentally friendly dyeing methods.

Career Highlights

Richard Huber is currently employed at Amann & Sohne GmbH & Co., a company known for its expertise in textile manufacturing. His work at the company has been instrumental in advancing their dyeing technologies and improving product quality.

Collaborations

Richard has collaborated with esteemed colleagues such as Rudolf Eggers and Joachim Von Schnitzler. Their combined efforts have fostered innovation and development within their projects.

Conclusion

Richard Huber's contributions to textile dyeing technology exemplify the impact of innovative thinking in the industry. His patent and collaborative efforts continue to influence advancements in textile processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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