Toronto, Canada

Richard H Snogren

This inventor holds 2 USPTO granted patents. Top assignee: E.i. Dupont De Nemours and Company. Active years: 2007-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Richard H Snogren. Retrieved from https://idiyas.com/inventor/richard-h-snogren

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Ontario, CA (2007)
  • Toronto, CA (2009)

Company Filing History:


Years Active: 2007-2009

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2 patents (USPTO):Explore Patents

Title: Richard H Snogren: Innovator in Innerlayer Panel Technology

Introduction

Richard H Snogren is a notable inventor based in Toronto, Canada. He has made significant contributions to the field of technology, particularly in the development of innerlayer panels and printed wiring boards. With a total of 2 patents to his name, Snogren's work has had a lasting impact on the industry.

Latest Patents

Snogren's latest patents include innovations in innerlayer panels and printed wiring boards with embedded fiducials. These innerlayer panels are designed with high-density fiducials during the manufacturing process. The fiducials can be identified using X-rays without the need to etch away portions of the innerlayer panel, which preserves the integrity of the panel.

Career Highlights

Throughout his career, Richard H Snogren has been associated with E.I. du Pont de Nemours and Company, a leading organization in the field of materials science and technology. His work has contributed to advancements in manufacturing processes and product reliability.

Collaborations

Some of his notable coworkers include William J Borland and Saul Ferguson. Their collaborative efforts have further enhanced the innovations brought forth by Snogren.

Conclusion

Richard H Snogren's contributions to the field of technology, particularly in innerlayer panel innovations, demonstrate his commitment to advancing manufacturing processes. His patents reflect a deep understanding of the industry's needs and a dedication to improving product quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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