Salinas, CA, United States of America

Richard H Flachbart

This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1976-1997.


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 27(Granted Patents)


Location History:

  • Brookfield Center, CT (US) (1976)
  • Salinas, CA (US) (1997)

Company Filing History:


Years Active: 1976-1997

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2 patents (USPTO):Explore Patents

Title: Innovations by Richard H Flachbart

Introduction

Richard H Flachbart is a notable inventor based in Salinas, CA (US). He has made significant contributions to the field of thin film technology, holding a total of 2 patents. His work has advanced manufacturing processes that are crucial for data recording and integrated circuit fabrication.

Latest Patents

Flachbart's latest patents include "High throughput manufacturing of thin film data recording disks" and "Lift-off method of fabricating thin films and a structure utilizable as." The first patent describes a method where a blank of aluminum alloy is partially cut to form several disks. These disks are maintained in the blank during the formation of thin films, allowing for efficient processing. The second patent outlines a method for creating thin film patterns in integrated circuits, involving a layered approach with positive photoresist materials.

Career Highlights

Richard H Flachbart is associated with the International Business Machines Corporation (IBM), where he has contributed to various innovative projects. His expertise in thin film technology has positioned him as a key player in the development of advanced manufacturing techniques.

Collaborations

Flachbart has worked alongside notable colleagues such as Bai Cwo Feng and Leonard J Fried. Their collaborative efforts have furthered the advancements in the technologies they specialize in.

Conclusion

Richard H Flachbart's contributions to thin film technology and his innovative patents reflect his significant role in the field. His work continues to influence manufacturing processes and integrated circuit fabrication.

Profile summary based on public USPTO records.
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