Annandale, VA, United States of America

Richard F Fensler


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Richard F. Fensler in Plasma Processing Technology

Introduction: Richard F. Fensler is a prominent inventor based in Annandale, Virginia, with a significant contribution to the field of plasma processing technology. He holds a patent for a groundbreaking system known as the Large Area Plasma Processing System (LAPPS), which showcases his ingenuity and expertise in the field.

Latest Patents: Fensler's notable patent, the Large Area Plasma Processing System, revolves around a system where an electron beam is utilized to generate plasma. The innovative design enables the creation of a large area of uniform plasma, significantly exceeding the thickness of the plasma itself. The dimensions of the plasma (which can be in the range of tens to hundreds of centimeters) allow for diverse applications in various fields. The unique characteristics of the LAPPS allow for better control over free radical production, enhancing the precision and efficacy of processing materials.

Career Highlights: Fensler's career is distinguished by his work with the United States of America, as represented by the Secretary of the Navy. His contributions to plasma processing have paved the way for advancements in the treatment of materials, offering remarkable precision and control in industrial applications.

Collaborations: Throughout his career, Richard F. Fensler has collaborated with esteemed colleagues in the field, including Robert A. Neger and Martin Lampe. Their collective expertise has further enhanced the development and implementation of innovative technologies, underscoring the importance of teamwork in advancing scientific research.

Conclusion: Richard F. Fensler's innovative spirit and dedication to advancing plasma processing technology have made a lasting impact in the field. Through his patent, the Large Area Plasma Processing System, he has demonstrated how collaboration and ingenuity can lead to groundbreaking advancements in material processing. His work continues to inspire future inventors and researchers in the pursuit of innovation.

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