Richard Denning is a notable inventor based in Springfield, NJ (US), recognized for his contributions to semiconductor technology. He holds a total of 3 patents, showcasing his innovative approach to solving complex engineering challenges.

Latest Patents

Denning's latest patents include a "Method of applying thin metal deposits to a substrate." This method involves immersing a silicon substrate in a basic, aqueous solution containing a metal salt, such as nickel, cobalt, or platinum, and reducing the metal ion to its elemental form using the exposed silicon as a reducing agent. Another significant patent is the "Method of fabricating a semiconductor device," which outlines a process for forming recesses that aid in the visual alignment of photomasks. This innovative approach reduces the total number of steps required for the formation of these recesses, particularly benefiting the fabrication of unisurface silicon controlled rectifiers.

Career Highlights

Richard Denning is currently associated with RCA Inc., where he applies his expertise in semiconductor fabrication. His work has significantly impacted the efficiency and effectiveness of semiconductor device manufacturing.

Collaborations

Denning has collaborated with notable colleagues, including Wojciech Rosnowski and Barry Polhemus, contributing to advancements in their field.

Conclusion

Richard Denning's innovative methods and patents have made a lasting impact on semiconductor technology. His work continues to influence the industry and inspire future innovations.

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