This inventor holds 1 USPTO granted patent. Top assignee: Delphi Technologies, Inc.. Active years: 2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2011
Title: Richard D Harlan: Innovator in Plasma Discharge Technology
Introduction
Richard D Harlan is a notable inventor based in Kokomo, Indiana. He has made significant contributions to the field of technology, particularly with his innovative patent related to plasma discharge methods. His work focuses on enhancing the verification of hermetic seals, which is crucial in various applications.
Latest Patents
Harlan holds a patent for a "Plasma discharge method and structure for verifying a hermetical seal." This invention utilizes the characteristics of plasma discharge to confirm the integrity of hermetic seals. The method involves creating a plasma discharge within a hermetically sealed cavity using a pair of spaced electrodes. These electrodes extend from tips inside the cavity to contacts located outside. An electrical bias is applied to these contacts, which is sufficient to generate a plasma discharge in a properly sealed cavity but not in an unsealed one. This innovative approach enhances the reliability of hermetic seal verification.
Career Highlights
Richard D Harlan is currently employed at Delphi Technologies, Inc., where he continues to develop and refine his technological innovations. His work at Delphi has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of Harlan's coworkers include Denise R Dewes and Brian E Dewes, who contribute to the collaborative environment at Delphi Technologies, Inc. Their combined expertise fosters innovation and drives advancements in technology.
Conclusion
Richard D Harlan's contributions to plasma discharge technology exemplify the importance of innovation in ensuring the reliability of hermetic seals. His patent reflects a significant advancement in the field, showcasing his dedication to improving technological processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
