Santa Clara, CA, United States of America

Richard Ciari


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2005

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Richard Ciari: Innovator in Semiconductor Cleaning Technology

Introduction

Richard Ciari is a notable inventor based in Santa Clara, California. He has made significant contributions to the field of semiconductor technology, particularly in the cleaning and drying processes of semiconductor wafers. His innovative approach has led to the development of a unique patent that enhances the efficiency and effectiveness of wafer preparation.

Latest Patents

Richard Ciari holds a patent for a "Cleaning and drying method and apparatus." This patent outlines a comprehensive method for cleaning semiconductor wafers before epitaxial deposition. The process includes several steps: etching silicon wafers with HF, rinsing with ozonated ultrapure water, treating with dilute SC1, and further rinsing. The method culminates in drying the wafers with nitrogen and a trace amount of IPA, all conducted within a single dryer chamber without removing the wafers between steps. This innovative system also features a single tank designed for cleaning, etching, rinsing, and drying wafers, with the capability to inject HF into a DI water stream.

Career Highlights

Richard Ciari is currently employed at Akrion, LLC, where he continues to advance semiconductor cleaning technologies. His work has been instrumental in improving the processes that are critical to the semiconductor manufacturing industry. His patent reflects his commitment to innovation and excellence in this highly technical field.

Collaborations

Richard has collaborated with several talented individuals in his field, including Ismail Kashkoush and Gim-Syang Chen. These collaborations have likely contributed to the development and refinement of his patented technologies.

Conclusion

Richard Ciari's contributions to semiconductor cleaning technology exemplify the spirit of innovation in the industry. His patented methods not only enhance the cleaning process but also streamline operations, showcasing the importance of continuous improvement in technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…