Richard C McElroy

Title: Richard C. McElroy: Innovator in Photographic Technology

Introduction

Richard C. McElroy is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of photographic technology, particularly with his innovative approach to impact-resistant photographic elements. His work has implications for both the durability and functionality of photographic materials.

Latest Patents

Richard C. McElroy holds a patent for an "Impact Resistant Photographic Element." This invention relates to a photographic element that comprises at least one layer of photosensitive silver halide. The base material includes at least one bottom sheet of biaxially oriented polymer sheet and a deformable tie layer material. The deformable tie layer material has a yield stress of between 6 and 10 MPa in compression, which is less than 10% of the yield stress of any of the other layers in the element. This innovation enhances the resilience of photographic elements, making them more suitable for various applications.

Career Highlights

Richard C. McElroy is associated with Eastman Kodak Company, a leader in imaging technology. His work at Kodak has allowed him to explore and develop new technologies that push the boundaries of traditional photography. His patent reflects his commitment to improving photographic materials and their performance.

Collaborations

Some of Richard's notable coworkers include Thaddeus S. Gula and Mamie Kam-Ng. Their collaborative efforts contribute to the innovative environment at Eastman Kodak Company, fostering advancements in photographic technology.

Conclusion

Richard C. McElroy's contributions to the field of photography through his innovative patent demonstrate his expertise and dedication to enhancing photographic materials. His work continues to influence the industry, paving the way for future advancements.