The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2002
Filed:
Aug. 22, 2000
Applicant:
Inventors:
Thaddeus S. Gula, Rochester, NY (US);
Richard C. McElroy, Rochester, NY (US);
Mamie Kam-Ng, Fairport, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/79 ; G03C 1/93 ; G03C 1/765 ;
U.S. Cl.
CPC ...
G03C 1/79 ; G03C 1/93 ; G03C 1/765 ;
Abstract
The invention relates to a photographic element comprising at least one layer of photosensitive silver halide, a base material wherein said base material comprises at least one bottom sheet of biaxially oriented polymer sheet and deformable tie layer material, wherein said deformable tie layer material yield stress of between 6 and 10 MPa in compression which is less than 10% the yield stress of any of the other layers in the element.