Richard B Ricker

Title: The Innovative Contributions of Richard B Ricker

Introduction

Richard B Ricker is a notable inventor based in Cornville, AZ (US). He has made significant contributions to the field of semiconductor processing through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Richard B Ricker holds a patent for an "Apparatus for generating a wet oxygen stream for a semiconductor processing furnace." This invention is designed to produce a wet oxygen stream that forms oxide layers on silicon wafers. The apparatus consists of a quartz vessel containing quartz chips, which is heated to 450°C. A mixture of water and oxygen is introduced at the bottom of the vessel, leading to vaporization. The output is a superheated stream of wet oxygen that passes through the chips and is directed to the furnace. The design ensures a constant ratio of water vapor to oxygen, allowing for the production of oxide layers with predictable characteristics.

Career Highlights

Throughout his career, Richard has demonstrated a commitment to advancing semiconductor technology. His innovative approach has led to the development of a unique apparatus that addresses specific challenges in the industry. His patent reflects his expertise and dedication to improving manufacturing processes.

Collaborations

Richard has worked alongside talented individuals such as Kent Ridgeway and Robert W Howard. Their collaboration has contributed to the successful development of innovative solutions in semiconductor processing.

Conclusion

Richard B Ricker's contributions to the field of semiconductor processing through his patent highlight his innovative spirit and technical expertise. His work continues to influence the industry, paving the way for advancements in semiconductor manufacturing.