Richard B Douglas

Title: Richard B Douglas: Innovator in Electron Beam Resists

Introduction

Richard B Douglas is a notable inventor based in Crystal, MN (US). He has made significant contributions to the field of materials science, particularly in the development of sensitive positive electron beam resists. His innovative work has implications for various applications in the semiconductor industry.

Latest Patents

Richard B Douglas holds 1 patent for his invention titled "Sensitive positive electron beam resists." This patent describes highly sensitive positive electron beam resists comprised of copolymers of methacrylic acid (MAA) and t-butyl methacrylate (TBM). The invention involves applying a thin film of high molecular weight MAA/TBM copolymer to a suitable substrate. Prior to exposure, the copolymer is prebaked at a temperature below the decomposition temperature to enhance sensitivity and resolution. The exposed resist is then developed by spraying with a suitable solvent. The positive electron resists produced exhibit high sensitivity and good submicron resolution.

Career Highlights

Richard B Douglas is currently associated with Honeywell GmbH, where he continues to advance his research and development efforts. His work at Honeywell has allowed him to explore innovative solutions in the field of electron beam technology.

Collaborations

Throughout his career, Richard has collaborated with several talented individuals, including Barbara J Fure and Juey H Lai. These collaborations have contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Richard B Douglas is a distinguished inventor whose work in sensitive positive electron beam resists has made a significant impact in the field of materials science. His innovative contributions continue to influence advancements in semiconductor technology.