Richard A Hartley, Jr

Title: Richard A Hartley, Jr: Innovator in Photolithography Technology

Introduction

Richard A Hartley, Jr. is a notable inventor based in Burlington Township, NJ (US). He has made significant contributions to the field of photolithography, particularly in the production of extreme ultra-violet light. His innovative approach has implications for integrated circuit fabrication and other advanced technologies.

Latest Patents

Richard A Hartley, Jr. holds a patent for a "Method and apparatus for adjustably supporting a light source for use in photolithography." This invention involves a method and apparatus for producing extreme ultra-violet light. It comprises a nozzle for flowing gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light, and optionally a diffuser for capturing a substantial portion of the gas for recycling in a closed-loop system. The extreme ultra-violet light produced is suitable for use in photolithography for integrated circuit fabrication. A remotely-controlled XYZ micro-positioning stage facilitates alignment of the nozzle and the diffuser to the radiated energy beam. He has 1 patent to his name.

Career Highlights

Richard A Hartley, Jr. is associated with Advanced Energy Systems, Inc., where he applies his expertise in photolithography technology. His work has contributed to advancements in the field, enhancing the capabilities of light sources used in various applications.

Collaborations

Some of his notable coworkers include Edwin Gerard Haas and Vincent A Christina. Their collaborative efforts have likely played a role in the development of innovative technologies in their field.

Conclusion

Richard A Hartley, Jr. is a distinguished inventor whose work in photolithography has paved the way for advancements in integrated circuit fabrication. His contributions continue to influence the industry and inspire future innovations.