This inventor holds 1 USPTO granted patent. Top assignee: General Electric Company. Active years: 2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013
Title: Richard A DePuy: Innovator in Gaseous Byproduct Removal
Introduction
Richard A DePuy is an accomplished inventor based in Burnt Hills, NY (US). He has made significant contributions to the field of gas processing, particularly in the removal of gaseous byproducts from synthesis gas. His innovative approach has led to the development of a patented method that enhances the efficiency of gas stream management.
Latest Patents
Richard A DePuy holds a patent for a method titled "Gaseous byproduct removal from synthesis gas." This patent describes a process that involves generating a gas stream containing gaseous byproducts through at least one partial-combustion device. The method includes channeling this gas stream to a fluid compression device to increase its pressure. Subsequently, the gas stream is directed to a gaseous byproducts removal system, where a solvent is used to absorb a portion of the gaseous byproducts. Finally, the method allows for the discharge of at least a portion of these byproducts from the removal system. Richard has 1 patent to his name.
Career Highlights
Richard A DePuy is associated with General Electric Company, where he has applied his expertise in gas processing technologies. His work has contributed to advancements in environmental sustainability and efficiency in gas management systems.
Collaborations
Richard has collaborated with notable colleagues, including Asiff Apdul Supahan and Ganesh Prasadh Kidambi. These partnerships have fostered innovation and development in their respective fields.
Conclusion
Richard A DePuy's contributions to the field of gaseous byproduct removal demonstrate his commitment to innovation and environmental sustainability. His patented method reflects a significant advancement in gas processing technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
