Monza, Italy

Riccardo Jurlaro

This inventor holds 1 USPTO granted patent. Top assignee: Hoechst Italia, S.p.a.. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Riccardo Jurlaro. Retrieved from https://idiyas.com/inventor/riccardo-jurlaro

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1992

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Riccardo Jurlaro: Innovator in Polymer Compositions

Introduction

Riccardo Jurlaro is a notable inventor based in Monza, Italy. He has made significant contributions to the field of polymer science, particularly through his innovative patent that enhances polymer compositions.

Latest Patents

Riccardo Jurlaro holds a patent for a photoactivating additive for polymer compositions. This additive is characterized as an oxidized polyethylene wax or other wax in the form of a salt with a metal selected from various groups of the Periodic Table. The additive acts as a photoactivator in a polymer composition and facilitates the degradation of the polymer. The quantity of this additive can vary from 0.1 to 2.0% by weight, relative to the weight of the composition. It can be incorporated directly or, more suitably, via a masterbatch.

Career Highlights

Riccardo Jurlaro is associated with Hoechst Italia S.p.A., where he applies his expertise in polymer technology. His work has contributed to advancements in the industry, particularly in the development of innovative materials.

Collaborations

[This section has been skipped due to space constraints.]

Conclusion

Riccardo Jurlaro's contributions to polymer compositions through his patent demonstrate his innovative spirit and commitment to advancing material science. His work continues to influence the field and inspire future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…