Company Filing History:
Years Active: 2010
Title: Innovations of Ri Kokun in Semiconductor Technology
Introduction
Ri Kokun is a notable inventor based in Hitachi, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of perfluoride processing. With a total of 2 patents, his work has been instrumental in enhancing the efficiency and functionality of clean rooms used in semiconductor fabrication.
Latest Patents
One of Ri Kokun's latest patents is a Perfluoride processing apparatus. This innovative device features a plurality of etchers, such as poly-etchers, installed within a clean room. A duct connects all the etchers to a PFC decomposition device, which is strategically placed outside the clean room. The exhaust gas containing PFC is drained from the etchers and supplied to the PFC decomposition device. Once heated, the PFC is decomposed by a catalyst within the device. This design eliminates the need for a dedicated space for the PFC decomposition device inside the clean room, allowing for size reduction or 'downsizing' of the clean room. Consequently, this innovation facilitates a more compact environment for semiconductor fabrication and liquid crystal manufacturing.
Career Highlights
Ri Kokun has been associated with Hitachi, Ltd., where he has contributed to various projects aimed at improving semiconductor manufacturing processes. His expertise in clean room technology has positioned him as a key figure in the industry.
Collaborations
Ri Kokun has worked alongside his coworker, Shin Tamata, to further advance their research and development efforts in semiconductor technology.
Conclusion
Ri Kokun's innovative contributions to the field of semiconductor technology, particularly through his patents, have significantly impacted the efficiency of clean room operations. His work continues to pave the way for advancements in the industry.