The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Apr. 19, 2005
RI Kokun, Hitachi, JP;
Shin Tamata, Oarai, JP;
Ri Kokun, Hitachi, JP;
Shin Tamata, Oarai, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plurality of etchers such as poly-etchersor the like are installed within a clean room. A ductthat is connected to all the etchers is connected to a PFC decomposition device, which is installed outside of the clean room. An exhaust gas which contains PFC as drained out of all the etchers within the clean roomis supplied by the ductto the inner space of PFC decomposition device. After having heated up within the PFC decomposition device, the PFC is decomposed by the action of a catalyst which is filled within the PFC decomposition device. It is no longer required to provide a space for installation of the PFC decomposition devicein the clean roomwith the semiconductor fabrication apparatus or the liquid crystal manufacturing apparatus installed therein, thus enabling size reduction or 'downsizing' of the clean room. It is possible to reduce the size of a clean room in which a semiconductor fabricating apparatus or a liquid crystal manufacturing apparatus is installed.