Chandler, AZ, United States of America

Renee M Defeo


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 55(Granted Patents)


Company Filing History:


Years Active: 2007-2010

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2 patents (USPTO):Explore Patents

Title: Inventor Renee M Defeo: A Trailblazer in Electrical Path Innovations

Introduction

Renee M Defeo is an accomplished inventor residing in Chandler, AZ, known for her significant contributions to the field of electrical engineering. With a remarkable portfolio consisting of two patents, Defeo has demonstrated her expertise in developing innovative methods and systems for improving electrical connectivity in integrated circuits.

Latest Patents

Renee's latest patents focus on a novel method and system for forming vias that include multiple electrical paths. The first patent outlines a method for creating a plurality of paths on a substrate by drilling an opening to expose several pads, lining the opening with conductive material, and insulating portions of the lining to establish separate electrical paths to the respective pads. Her second patent details an integrated circuit that incorporates these innovative vias, allowing for better interconnectivity between layers of conductive material, thus enhancing the performance of electronic devices.

Career Highlights

Throughout her career, Renee has worked at Intel Corporation, where she has leveraged her skills and knowledge to contribute to cutting-edge technology in the semiconductor industry. Her work has not only advanced engineering practices but has also played a crucial role in developing more efficient electronic systems.

Collaborations

Renee's collaborations with prominent engineers and inventors like Todd B Myers and Nicholas Randolph Watts further highlight her commitment to teamwork and innovation. Together, they have worked on various projects that have pushed the boundaries of electrical engineering and semiconductor technologies.

Conclusion

Renee M Defeo is a prominent figure in the landscape of electrical innovations, with her patents exemplifying her pioneering spirit and technical acumen. As she continues to work at Intel Corporation, her contributions will undoubtedly influence the future of integrated circuit design and electrical path formation for years to come.

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