Moissy Cramayel, France

Renaud Venture

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Safran Nacelles. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Renaud Venture. Retrieved from https://idiyas.com/inventor/renaud-venture-14mvpubf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Renaud Venture: Innovator in Patch Application Technology

Introduction

Renaud Venture is a notable inventor based in Moissy Cramayel, France. He has made significant contributions to the field of technology, particularly in the area of patch application systems. His innovative approach has led to the development of a unique method that enhances the efficiency of applying patches.

Latest Patents

Renaud Venture holds a patent for a "Method and system for controlling the application of a patch." This patent outlines a method for controlling the application of a patch, which includes several systematic steps designed to improve the process. His work in this area demonstrates his commitment to advancing technology and providing practical solutions.

Career Highlights

Renaud is currently employed at Safran Nacelles, a company known for its expertise in aerospace propulsion systems. His role at Safran Nacelles allows him to apply his innovative ideas in a practical setting, contributing to the company's success and technological advancements.

Collaborations

Renaud has collaborated with his coworker, Clément Rolland, to further enhance the development of their projects. Their teamwork exemplifies the importance of collaboration in driving innovation and achieving successful outcomes.

Conclusion

Renaud Venture is a dedicated inventor whose work in patch application technology has the potential to make a significant impact in the industry. His innovative methods and collaboration with colleagues highlight the importance of teamwork in the pursuit of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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